Exclusive

Publication

Byline

Location

US Patent Issued to FUJIFILM on Sept. 1 for "Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,344, issued on Sept. 1, was assigned to FUJIFILM Corp. (Tokyo). "Actinic ray-sensitive or radiation-sensitive resin composition, resist fil... Read More


US Patent Issued to TORAY INDUSTRIES on Sept. 1 for "Photosensitive resin composition, photosensitive sheet, cured film, method for producing cured film, electronic component, antenna element, semiconductor package, and display device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,345, issued on Sept. 1, was assigned to TORAY INDUSTRIES Inc. (Tokyo). "Photosensitive resin composition, photosensitive sheet, cured film,... Read More


US Patent Issued to Inha University Research and Business Foundation on Sept. 1 for "Underlayer compound for photolithography, multilayered structure formed using the same, and method for manufacturing semiconductor devices using the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,346, issued on Sept. 1, was assigned to Inha University Research and Business Foundation (Incheon, South Korea). "Underlayer compound for p... Read More


US Patent Issued to NISSAN CHEMICAL on Sept. 1 for "Composition for forming resist underlayer film" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,347, issued on Sept. 1, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Composition for forming resist underlayer film" was invented by Hir... Read More


US Patent Issued to Shanghai Huali Integrated Circuit on Sept. 1 for "Method for adjusting local thickness of photoresist" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,348, issued on Sept. 1, was assigned to Shanghai Huali Integrated Circuit Corp. (Shanghai). "Method for adjusting local thickness of photor... Read More


US Patent Issued to ZHEJIANG JINKO SOLAR, JINKO SOLAR on Sept. 1 for "Method for forming a monodisperse granular film" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,349, issued on Sept. 1, was assigned to ZHEJIANG JINKO SOLAR Co. LTD. (Haining, China) and JINKO SOLAR Co. LTD. (Jiangxi, China). "Method f... Read More


US Patent Issued to NISSAN CHEMICAL on Sept. 1 for "Pattern-forming composition" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,350, issued on Sept. 1, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Pattern-forming composition" was invented by Naoki Nakaie (Funabash... Read More


US Patent Issued to CANON on Sept. 1 for "Exposure apparatus and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,351, issued on Sept. 1, was assigned to CANON K.K. (Tokyo). "Exposure apparatus and article manufacturing method" was invented by Shohei Iw... Read More


US Patent Issued to Mycronic on Sept. 1 for "Edge placement with spatial light modulator writing" (Swedish Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,352, issued on Sept. 1, was assigned to Mycronic AB (Taby, Sweden). "Edge placement with spatial light modulator writing" was invented by M... Read More


US Patent Issued to International Business Machines on Sept. 1 for "Optimal scanner maps and field layouts" (New York Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,353, issued on Sept. 1, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Optimal scanner maps and field layouts" was ... Read More